A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiO2 particles through oxidation and/or through hydrolysis, (d) depositing the SiO2 particles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiO2 particles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m2/g. A device for carrying out the method is also provided.