- Patent Title: In-liquid plasma generation device and liquid treatment apparatus
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Application No.: US16617455Application Date: 2018-05-22
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Publication No.: US11267729B2Publication Date: 2022-03-08
- Inventor: Akira Horikoshi , Shohei Nakamura , Shigeru Takatsuji , Motohiro Kono
- Applicant: SCREEN HOLDINGS CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: SCREEN HOLDINGS CO., LTD.
- Current Assignee: SCREEN HOLDINGS CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: McDermott Will & Emery LLP
- Priority: JPJP2017-108021 20170531,JPJP2018-097043 20180521
- International Application: PCT/JP2018/019694 WO 20180522
- International Announcement: WO2018/221325 WO 20181206
- Main IPC: C02F1/46
- IPC: C02F1/46 ; B01J19/08

Abstract:
An in-liquid plasma generation device includes a housing which holds a liquid in an internal space, a gas supply tube which includes an opening in the internal space and discharges a gas into the liquid through the opening, a first electrode which has projecting part projecting into the internal space via the opening from inside of the gas supply tube, the projecting part including a conductor covered by a dielectric, a second electrode which surrounds the projecting part of the first electrode and includes a conductor isolated from the liquid by a dielectric, and a voltage applier which applies a voltage to between the first electrode and the second electrode. A space between the projecting part and the second electrode is a flow passage in which the gas discharged from the opening flows.
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