Invention Grant
- Patent Title: Apparatus for processing substrate and method for detecting a presence of a focus ring on a stage
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Application No.: US16813855Application Date: 2020-03-10
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Publication No.: US11264267B2Publication Date: 2022-03-01
- Inventor: Takaharu Miyadate , Takashi Taira , Kenji Nagai , Hideaki Nagasaki
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Xsensus LLP
- Priority: JPJP2019-055024 20190322
- Main IPC: H01L21/68
- IPC: H01L21/68 ; H01L21/687 ; H01L21/67 ; H01L21/677

Abstract:
A substrate processing apparatus includes a stage, a light source, an optical assembly, a light receiver, and controller circuitry. The stage includes a first placing surface on which a substrate is to be placed, and a second placing surface that surrounds the first placing surface and on which a focus ring is to be placed. The optical assembly focuses light from the light source on a lower surface position, which is a position of a lower surface of the focus ring placed on the second placing surface. The light receiver receives light from the lower surface position. The controller circuitry detects at least one of a presence and an absence of the focus ring on the second placing surface, based on light received by the light receiver.
Public/Granted literature
- US20200303235A1 APPARATUS FOR PROCESSING SUBSTRATE AND METHOD FOR DETECTING A PRESENCE OF A FOCUS RING ON A STAGE Public/Granted day:2020-09-24
Information query
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