Invention Grant
- Patent Title: Wafer debonding and cleaning apparatus
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Application No.: US16444010Application Date: 2019-06-18
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Publication No.: US11264262B2Publication Date: 2022-03-01
- Inventor: Wen-Chih Chiou , Yu-Liang Lin , Hung-Jung Tu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/683 ; H01L21/02

Abstract:
The present disclosure, in some embodiments, relates to a debonding and cleaning apparatus. The apparatus has a debonding module configured to separate semiconductor substrates from carrier substrates. A first cleaning module is configured to clean surfaces of a first plurality of the semiconductor substrates and a second cleaning module is configured to clean surfaces of a second plurality of the semiconductor substrates. The apparatus also has a first substrate handling module including a first robotic arm in communication with the debonding module and a second substrate handling module including a second robotic arm that is located between the first cleaning module and the second cleaning module. The second substrate handling module is configured to transfer the first plurality of the semiconductor substrates to first cleaning module and to transfer the second plurality of the semiconductor substrates to the second cleaning module.
Public/Granted literature
- US20190304828A1 WAFER DEBONDING AND CLEANING APPARATUS Public/Granted day:2019-10-03
Information query
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