Invention Grant
- Patent Title: Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography
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Application No.: US16655582Application Date: 2019-10-17
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Publication No.: US11264206B2Publication Date: 2022-03-01
- Inventor: Akira Fujimura , Thang Nguyen , Ajay Baranwal , Michael J. Meyer , Suhas Pillai
- Applicant: D2S, Inc.
- Applicant Address: US CA San Jose
- Assignee: D2S, Inc.
- Current Assignee: D2S, Inc.
- Current Assignee Address: US CA San Jose
- Agency: MLO, a professional corp.
- Main IPC: H01J37/317
- IPC: H01J37/317 ; G06N3/00 ; G06N3/10 ; G06N3/08 ; G06N3/04
Abstract:
Methods for fracturing or mask data preparation are disclosed in which a set of single-beam charged particle beam shots is input; a calculated image is calculated using a neural network, from the set of single-beam charged particle beam shots; and a set of multi-beam shots is generated based on the calculated image, to convert the set of single-beam charged particle beam shots to the set of multi-beam shots which will produce a surface image on the surface. Methods for training a neural network include inputting a set of single-beam charged particle beam shots; calculating a set of calculated images using the set of single-beam charged particle beam shots; and training the neural network with the set of calculated images.
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