Invention Grant
- Patent Title: Plating apparatus and operation method thereof
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Application No.: US16656863Application Date: 2019-10-18
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Publication No.: US11261535B2Publication Date: 2022-03-01
- Inventor: Amlan Sen , Navaneetha Kumaran Baheerathan
- Applicant: PYXIS CF PTE. LTD.
- Applicant Address: SG Singapore
- Assignee: PYXIS CF PTE. LTD.
- Current Assignee: PYXIS CF PTE. LTD.
- Current Assignee Address: SG Singapore
- Agency: Hasse & Nesbitt LLC
- Agent Daniel F. Nesbitt
- Priority: SG10201902611P 20190322,CN201910391509.6 20190510
- Main IPC: C25D17/10
- IPC: C25D17/10 ; C25D17/06 ; C25D5/08 ; C25D17/02 ; H01L21/288

Abstract:
A plating apparatus and an operation method thereof are provided. The plating apparatus includes: a tank body including at least one side wall, the at least one side wall being provided with an opening extending from the inside to the outside of the tank body, and the tank body being configured to accommodate a plating solution; and a fixing device configured to fix the substrate at the opening of the side wall. The operation method of the plating apparatus includes: placing the substrate on an outer side of the side wall and at the position of the opening, and operating the fixing device to fix the substrate; and performing plating treatment on the substrate.
Public/Granted literature
- US20200299854A1 PLATING APPARATUS AND OPERATION METHOD THEREOF Public/Granted day:2020-09-24
Information query