- Patent Title: Composite substrate and method of manufacturing composite substrate
-
Application No.: US16073063Application Date: 2017-01-06
-
Publication No.: US11245377B2Publication Date: 2022-02-08
- Inventor: Shoji Akiyama , Masayuki Tanno
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Hauptman Ham, LLP
- Priority: JPJP2016-017916 20160202,JPJP2016-043992 20160308
- International Application: PCT/JP2017/000272 WO 20170106
- International Announcement: WO2017/134980 WO 20170810
- Main IPC: H03H3/08
- IPC: H03H3/08 ; H03H9/02 ; H01L41/187 ; H01L41/312 ; H03H3/02 ; H03H9/25 ; H01L21/86 ; H01L41/337

Abstract:
A composite substrate includes a single crystal support substrate containing first element as a main component; an oxide single crystal layer provided on the single crystal support substrate and containing a second element (excluding oxygen) as a main component; and an amorphous layer provided in between the single crystal support substrate and the oxide single crystal layer and containing a first element, a second element, and Ar, the amorphous layer having a first amorphous region in which proportion of the first element is higher than proportion of the second element, and a second amorphous region in which the proportion of the second element is higher than the proportion of the first element, concentration of Ar contained in the first amorphous region being higher than concentration of Ar contained in the second amorphous region and being 3 atom % or more.
Public/Granted literature
- US20190036505A1 COMPOSITE SUBSTRATE AND METHOD OF MANUFACTURING COMPOSITE SUBSTRATE Public/Granted day:2019-01-31
Information query