- Patent Title: Monopole antenna array source for semiconductor process equipment
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Application No.: US15858789Application Date: 2017-12-29
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Publication No.: US11244808B2Publication Date: 2022-02-08
- Inventor: Qiwei Liang , Srinivas D. Nemani
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/46 ; H01L21/3065 ; C23C16/503 ; C23C16/26 ; C23C16/455 ; C23C16/50 ; H01L21/02 ; H01L21/67
Abstract:
A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distribution port to deliver a processing gas to the plasma chamber, a workpiece support to hold a workpiece, an antenna array comprising a plurality of monopole antennas extending partially into the plasma chamber, and an AC power source to supply a first AC power to the plurality of monopole antennas.
Public/Granted literature
- US20180342373A1 MONOPOLE ANTENNA ARRAY SOURCE FOR SEMICONDUCTOR PROCESS EQUIPMENT Public/Granted day:2018-11-29
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