Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16725391Application Date: 2019-12-23
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Publication No.: US11239388B2Publication Date: 2022-02-01
- Inventor: Meng-Yang Chen , Jung-Jen Li
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW107146841 20181224
- Main IPC: H01L33/18
- IPC: H01L33/18 ; H01L33/22 ; H01L33/30 ; H01L33/38 ; H01L33/50 ; H01L33/56 ; H01L33/62 ; H01L33/40

Abstract:
A semiconductor device includes a first type semiconductor structure, an active structure, and a contact layer. The first type semiconductor structure includes a first lattice constant, a first side and a second side opposite to the first side. The active structure is on the first side of the first type semiconductor structure and emits a radiation, and the radiation has a peak wavelength between 1000 nm and 2000 nm. The contact layer is on the second side of the first type semiconductor structure and includes a second lattice constant. A difference between the first lattice constant and the second lattice constant is at least 0.5%.
Information query
IPC分类: