Invention Grant
- Patent Title: Active gas generation apparatus
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Application No.: US16764898Application Date: 2018-01-10
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Publication No.: US11239059B2Publication Date: 2022-02-01
- Inventor: Kensuke Watanabe , Shinichi Nishimura , Ren Arita , Yoshihito Yamada , Yoichiro Tabata
- Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
- Applicant Address: JP Tokyo
- Assignee: Toshiba Mitsubishi-Electric Industrial Systems Corporation
- Current Assignee: Toshiba Mitsubishi-Electric Industrial Systems Corporation
- Current Assignee Address: JP Tokyo
- Agency: Xsensus LLP
- International Application: PCT/JP2018/000254 WO 20180110
- International Announcement: WO2019/138456 WO 20190718
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/452 ; C23C16/455 ; C23C16/50

Abstract:
The present invention has features (1) to (3). The feature (1) is that “an active gas generation electrode group is formed in such a manner that a ground side electrode component supports a high-voltage side electrode component”. The feature (2) is that “stepped parts are provided in a discharge space outside region of a dielectric electrode in the high-voltage side electrode component, and project downward, and by a formation height of these stepped parts, the gap length of a discharge space is defined”. The feature (3) is that “the high-voltage side electrode component and the ground side electrode component are formed to have the thickness of a discharge space formation region relatively thin and the thickness of a discharge space outside region relatively thick”.
Public/Granted literature
- US20200343078A1 ACTIVE GAS GENERATION APPARATUS Public/Granted day:2020-10-29
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