- Patent Title: Backside illuminated image sensor and method of manufacturing same
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Application No.: US16508056Application Date: 2019-07-10
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Publication No.: US11222917B2Publication Date: 2022-01-11
- Inventor: Chang-Hun Han , Tae-Wook Kang
- Applicant: DB HiTek Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: DB HiTek Co., Ltd.
- Current Assignee: DB HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Central California IP Group, P.C.
- Agent Andrew D. Fortney
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
Disclosed is a backside illuminated image sensor and a method of manufacturing the same and, more particularly, a backside illuminated image sensor and a method of manufacturing the same, in which a height difference is between a pixel region and a surrounding region having a boundary between on an uppermost or back surface of a substrate, thereby eliminating one or more problems that occur when a thickness of a color filter in the pixel region is uneven.
Information query
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