Invention Grant
- Patent Title: Anti-static metal oxide semiconductor field effect transistor structure
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Application No.: US16980368Application Date: 2019-03-05
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Publication No.: US11222888B2Publication Date: 2022-01-11
- Inventor: Jun Sun
- Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Applicant Address: CN Jiangsu
- Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee Address: CN Jiangsu
- Agency: Intellectual Property Law Group LLP
- Priority: CN201810204910.X 20180313
- International Application: PCT/CN2019/077018 WO 20190305
- International Announcement: WO2019/174495 WO 20190919
- Main IPC: H01L23/62
- IPC: H01L23/62 ; H01L27/02 ; H01L27/07 ; H01L29/08 ; H01L29/78 ; H01L23/60 ; H01L29/87

Abstract:
An anti-static metal oxide semiconductor field effect transistor structure includes an anti-static body structure and a slave metal oxide semiconductor field effect transistor, the anti-static body structure includes: a main metal oxide semiconductor field effect transistor; a first silicon controlled rectifier, an anode thereof being connected to a drain of the main metal oxide semiconductor field effect transistor, a cathode and a control electrode thereof being connected to a source of the main metal oxide semiconductor field effect transistor; and a second silicon controlled rectifier, an anode thereof being connected to the drain of the main metal oxide semiconductor field effect transistor, a cathode thereof being connected to a gate of the main metal oxide semiconductor field effect transistor, a control electrode thereof being connected to the source or the gate of the main metal oxide semiconductor field effect transistor.
Public/Granted literature
- US20210043623A1 ANTI-STATIC METAL OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR STRUCTURE Public/Granted day:2021-02-11
Information query
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