Invention Grant
- Patent Title: Supporting substrate, supporting substrate-attached laminate and method for manufacturing a package substrate for mounting a semiconductor device
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Application No.: US16323172Application Date: 2017-08-04
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Publication No.: US11217445B2Publication Date: 2022-01-04
- Inventor: Syunsuke Hirano , Yoshihiro Kato , Takaaki Ogashiwa , Kazuaki Kawashita , Youichi Nakajima
- Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JPJP2016-154890 20160805,JPJP2017-086338 20170425
- International Application: PCT/JP2017/028432 WO 20170804
- International Announcement: WO2018/026004 WO 20180208
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L23/12 ; H01L21/48 ; H01L23/538 ; H05K3/00 ; H01L23/498 ; H01L23/522 ; H01L23/528 ; H05K3/46

Abstract:
A method for manufacturing a package substrate for mounting a semiconductor device including: a first laminate preparing step of preparing a first laminate including a resin layer, a bonding layer that is provided on at least one surface side of the resin layer and includes peeling means, and a first metal layer provided on the bonding layer; a first wiring forming step of forming a first wiring conductor in the first laminate by etching the first metal layer; a second laminate forming step of forming a second laminate by laminating an insulating resin layer and a second metal layer in this order on a surface of the first laminate, the surface being provided with the first wiring conductor; a second wiring forming step of forming a second wiring conductor on the insulating resin layer by forming a non-through hole in the insulating resin layer.
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