Invention Grant
- Patent Title: Apparatus of plural charged-particle beams
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Application No.: US16357309Application Date: 2019-03-18
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Publication No.: US11217423B2Publication Date: 2022-01-04
- Inventor: Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen , Jack Jau
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL AH Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL AH Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: H01J37/28
- IPC: H01J37/28

Abstract:
A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
Public/Granted literature
- US20190279842A1 APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS Public/Granted day:2019-09-12
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