Invention Grant
- Patent Title: Sulfonium compound, resist composition, and patterning process
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Application No.: US16108645Application Date: 2018-08-22
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Publication No.: US11215926B2Publication Date: 2022-01-04
- Inventor: Takayuki Fujiwara , Ryo Mitsui , Masaki Ohashi , Ryosuke Taniguchi , Koji Hasegawa
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JPJP2017-161031 20170824
- Main IPC: G03F7/06
- IPC: G03F7/06 ; G03F7/004 ; G03F7/033 ; C07D333/76 ; C07D327/08 ; G03F7/32 ; C07D339/08 ; G03F7/039 ; C07C381/12 ; C07C323/64
Abstract:
A resist composition comprising a sulfonium compound of specific structure as PAG has excellent lithography performance factors such as minimal defects, high sensitivity, improved LWR and CDU, and is a quite effective resist material for precise micropatterning.
Public/Granted literature
- US20190064665A1 SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2019-02-28
Information query
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