Invention Grant
- Patent Title: Heat treatment apparatus of light irradiation type and heat treatment method
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Application No.: US15980385Application Date: 2018-05-15
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Publication No.: US11081409B2Publication Date: 2021-08-03
- Inventor: Mao Omori , Takashi Ito , Nobuhiko Nishide
- Applicant: SCREEN HOLDINGS CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: SCREEN HOLDINGS CO., LTD.
- Current Assignee: SCREEN HOLDINGS CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: McDermott Will & Emery LLP
- Priority: JPJP2017-097969 20170517
- Main IPC: H01L21/66
- IPC: H01L21/66 ; H01L21/67 ; H01L21/324 ; H01L21/687

Abstract:
A first mass flow controller is provided in an inert gas pipe for feeding nitrogen gas. A second mass flow controller is provided in a reactive gas pipe for feeding ammonia. A joint pipe communicatively connects a joint portion of the inert gas pipe and the reactive gas pipe to a chamber for treating a semiconductor wafer. The joint pipe is provided with a mass flowmeter. A detector detects gas leakage by comparing a total value of flow rates of nitrogen controlled by the first mass flow controller and of ammonia controlled by the second mass flow controller with a measurement value of a flow rate of a treatment gas, obtained by the mass flowmeter.
Public/Granted literature
- US20180337103A1 HEAT TREATMENT APPARATUS OF LIGHT IRRADIATION TYPE AND HEAT TREATMENT METHOD Public/Granted day:2018-11-22
Information query
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