Invention Grant
- Patent Title: Method of forming a solderable solder deposit on a contact pad
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Application No.: US16466817Application Date: 2017-12-22
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Publication No.: US11032914B2Publication Date: 2021-06-08
- Inventor: Kai-Jens Matejat , Sven Lamprecht , Jan Sperling , Christian Ohde
- Applicant: Atotech Deutschland GmbH
- Applicant Address: DE Berlin
- Assignee: Atotech Deutschland GmbH
- Current Assignee: Atotech Deutschland GmbH
- Current Assignee Address: DE Berlin
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: EP16206665 20161223
- International Application: PCT/EP2017/084320 WO 20171222
- International Announcement: WO2018/115408 WO 20180628
- Main IPC: C25D5/54
- IPC: C25D5/54 ; H05K3/34 ; C25D7/00 ; H05K1/11 ; H05K3/10 ; H05K3/24

Abstract:
A method of forming a solderable solder deposit on a contact pad, comprising the steps of providing an organic, non-conductive substrate which exposes said contact pad under an opening of a first non-conductive resist layer, depositing a conductive layer inside and outside the opening such that an activated surface results, thereby forming an activated opening, electrolytically depositing nickel or nickel alloy into the activated opening such that nickel/nickel alloy is deposited onto the activated surface, electrolytically depositing tin or tin alloy onto the nickel/nickel alloy, with the proviso that the electrolytic deposition of later steps results in an entirely filled activated opening, wherein the entirely filled activated opening is completely filled with said nickel/nickel alloy, or in the entirely filled activated opening the total volume of nickel/nickel alloy is higher than the total volume of tin and tin alloy, based on the total volume of the entirely filled activated opening.
Information query