Invention Grant
- Patent Title: Diffusion barrier collar for interconnects
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Application No.: US16143850Application Date: 2018-09-27
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Publication No.: US11031285B2Publication Date: 2021-06-08
- Inventor: Rajesh Katkar , Cyprian Emeka Uzoh
- Applicant: Invensas Bonding Technologies, Inc.
- Applicant Address: US CA San Jose
- Assignee: Invensas Bonding Technologies, Inc.
- Current Assignee: Invensas Bonding Technologies, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L23/00 ; H01L21/68 ; H01L25/065 ; H01L23/532 ; H01L25/00

Abstract:
Representative implementations of techniques and devices are used to reduce or prevent conductive material diffusion into insulating or dielectric material of bonded substrates. Misaligned conductive structures can come into direct contact with a dielectric portion of the substrates due to overlap, especially while employing direct bonding techniques. A barrier interface that can inhibit the diffusion is disposed generally between the conductive material and the dielectric at the overlap.
Public/Granted literature
- US20190109042A1 DIFFUSION BARRIER COLLAR FOR INTERCONNECTS Public/Granted day:2019-04-11
Information query
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