Invention Grant
- Patent Title: Method for producing porous copper foil and porous copper foil produced by the same
-
Application No.: US15924215Application Date: 2018-03-18
-
Publication No.: US11028495B2Publication Date: 2021-06-08
- Inventor: Sung Wook Chun , Ik Beom Kim , Seon Gi Jeon , Dae Hoon Lee , Youn Bong Kang , Jun Mo Hong , Hyeong Gyu Park
- Applicant: YMT CO., LTD.
- Applicant Address: KR Icheon
- Assignee: YMT CO., LTD.
- Current Assignee: YMT CO., LTD.
- Current Assignee Address: KR Icheon
- Agency: STIP Law Group, LLC
- Priority: KR10-2017-0040600 20170330
- Main IPC: C25D1/08
- IPC: C25D1/08 ; C23C18/16 ; C25D3/38 ; C23C18/38 ; C23F17/00 ; C25D1/04 ; C25D1/20 ; C23C18/54

Abstract:
Provided is a method for producing a porous copper foil. The method includes forming a release layer on a metal carrier, growing copper islands on the metal carrier formed with the release layer by electroless copper plating, forming a porous copper thin layer by copper electroplating, and peeling off the porous copper thin layer from the release layer.
Public/Granted literature
- US20180282890A1 METHOD FOR PRODUCING POROUS COPPER FOIL AND POROUS COPPER FOIL PRODUCED BY THE SAME Public/Granted day:2018-10-04
Information query