Invention Grant
- Patent Title: Fin field effect transistor including a single diffusion break with a multi-layer dummy gate
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Application No.: US16570701Application Date: 2019-09-13
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Publication No.: US11024739B2Publication Date: 2021-06-01
- Inventor: Kangguo Cheng
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent L. Jeffrey Kelly
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/66 ; H01L27/088 ; H01L21/8234

Abstract:
In one example, a fin field effect transistor including a single diffusion break with a multi-layer dummy gate is disclosed. One example of field effect transistor includes a first transistor array comprising a first active gate, a second transistor array comprising a second active gate, and a single diffusion break formed between the first transistor array and the second transistor array, wherein the single diffusion break comprises a dummy gate comprising multiple layers of different materials.
Public/Granted literature
- US20200066898A1 FIN FIELD EFFECT TRANSISTOR INCLUDING A SINGLE DIFFUSION BREAK WITH A MULTI-LAYER DUMMY GATE Public/Granted day:2020-02-27
Information query
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