Invention Grant
- Patent Title: Electrostatic chuck device having focus ring
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Application No.: US15769672Application Date: 2016-10-21
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Publication No.: US11024528B2Publication Date: 2021-06-01
- Inventor: Yoshiaki Moriya , Keigo Maki , Hitoshi Kouno , Kazuto Ando , Yuuki Kinpara
- Applicant: SUMITOMO OSAKA CEMENT CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Merchant & Gould P.C.
- Priority: JPJP2015-207060 20151021
- International Application: PCT/JP2016/081262 WO 20161021
- International Announcement: WO2017/069238 WO 20170427
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/687 ; H01L21/67

Abstract:
An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the placing surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.
Public/Granted literature
- US20180308737A1 ELECTROSTATIC CHUCK DEVICE Public/Granted day:2018-10-25
Information query
IPC分类: