Invention Grant
- Patent Title: Semiconductor device having a base body of silicon carbide
-
Application No.: US16566555Application Date: 2019-09-10
-
Publication No.: US10998401B2Publication Date: 2021-05-04
- Inventor: Johji Nishio , Chiharu Ota , Ryosuke Iijima
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2018-198729 20181022
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06 ; H01L29/16 ; H01L29/32 ; H01L21/02 ; H01L29/739 ; H01L29/78 ; H01L29/872

Abstract:
According to one embodiment, a semiconductor device includes a base body including silicon carbide, a first semiconductor region including silicon carbide and a first element, and a second semiconductor region including silicon carbide and the first element. The first semiconductor region includes first and second intermediate regions. A first concentration of the first element in the first intermediate region satisfies a first or a second condition. In the first condition, the first concentration is lower than a second concentration of the first element in the second intermediate region. In the second condition, the first concentration is higher than a third concentration of a second element included in the first intermediate region, the second concentration is higher than a fourth concentration of the second element in the second intermediate region, and a difference between the first and third concentrations is smaller than a difference between the second and fourth concentrations.
Information query
IPC分类: