Invention Grant
- Patent Title: Vertical memory device and method for fabricating the same
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Application No.: US16458785Application Date: 2019-07-01
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Publication No.: US10998333B2Publication Date: 2021-05-04
- Inventor: Kwang-Seok Oh
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon-si
- Assignee: SK hynix Inc.
- Current Assignee: SK hynix Inc.
- Current Assignee Address: KR Icheon-si
- Agency: William Park & Associates Ltd.
- Priority: KR10-2018-0114074 20180921
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L23/522 ; H01L27/11565

Abstract:
A vertical memory device includes a substrate, a plurality of gate electrodes vertically stacked over the substrate in a cell array region, and a plurality of multi-layered pad portions formed over the substrate in a contact region. Each multi-layered pad portion of the plurality of multi-layered pad portions extends from an end of a gate electrode of the plurality of gate electrodes. Each multi-layered pad portion of the plurality of multi-layered pad portions includes a lower pad, an upper pad spaced vertically apart from the lower pad, a buffer pad formed between the lower pad and the upper pad, and a pad interconnection portion interconnecting the lower pad and the upper pad.
Public/Granted literature
- US20200098788A1 VERTICAL MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2020-03-26
Information query
IPC分类: