Plasma source and semiconductor processing apparatus
Abstract:
A plasma source includes a dielectric cylinder, a coil sounding a circumference of the dielectric cylinder, and coil case encasing the coil. The coil case has a first gas inlet disposed at a bottom area of a sidewall of the coil case for introducing a cooling gas to the coil case. The coil case has a first gas outlet disposed at a top wall of the coil case for venting the cooling gas from the coil case.
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