Invention Grant
- Patent Title: Dielectric material, method of manufacturing thereof, and dielectric devices and electronic devices including the same
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Application No.: US15848562Application Date: 2017-12-20
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Publication No.: US10998133B2Publication Date: 2021-05-04
- Inventor: Daejin Yang , Jong Wook Roh , Doh Won Jung , Chan Kwak , Hyungjun Kim , Woojin Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Cantor Colburn LLP
- Priority: KR10-2017-0030659 20170310
- Main IPC: H01G4/06
- IPC: H01G4/06 ; C04B35/49 ; H01G4/10 ; H01G4/12 ; B82B1/00 ; B32B15/04

Abstract:
A dielectric material includes a layered metal oxide including a first layer having a positive charge and a second layer having a negative charge, wherein the first layer and the second layer are alternately disposed; a monolayered nanosheet; a nanosheet laminate of the monolayered nanosheets; or a combination thereof, wherein the dielectric material includes a two-dimensional layered material having a two-dimensional crystal structure, wherein the two-dimensional layered material is represented by Chemical Formula 1 X2[A(n−1)MnO(3n+1)] Chemical Formula 1 wherein, in Chemical Formula 1, X is H, an alkali metal, a cationic polymer, or a combination thereof, A is Ca, Sr, La, Ta, or a combination thereof, M is La, Ta, Ti, or a combination thereof, and n≥1.
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