Invention Grant
- Patent Title: Apparatus for monitoring process chamber
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Application No.: US16262024Application Date: 2019-01-30
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Publication No.: US10971343B2Publication Date: 2021-04-06
- Inventor: Protopopov Vladimir , Ki Ho Hwang , Doug Yong Sung , Se Jin Oh , Kul Inn , Sung Ho Jang , Yun Kwang Jeon
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2016-0009899 20160127
- Main IPC: G06K9/00
- IPC: G06K9/00 ; H01J37/32 ; H04N5/225

Abstract:
An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
Public/Granted literature
- US20190164731A1 APPARATUS FOR MONITORING PROCESS CHAMBER Public/Granted day:2019-05-30
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