Invention Grant
- Patent Title: Mask and manufacturing method thereof, and light shielding device and control method thereof
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Application No.: US15776039Application Date: 2017-10-09
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Publication No.: US10969643B2Publication Date: 2021-04-06
- Inventor: Benxiang Hou , Zhiguang Guo , Xilei Yin , Xin Xiang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing; CN Anhui
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing; CN Anhui
- Agency: McDermott Will & Emery LLP
- Priority: CN201710142079.5 20170310
- International Application: PCT/CN2017/105383 WO 20171009
- International Announcement: WO2018/161560 WO 20180913
- Main IPC: G02F1/163
- IPC: G02F1/163 ; G02F1/153
Abstract:
A mask includes a base substrate, control switches provided on the base substrate, and electrochromic film components provided on the base substrate. The control switches and the electrochromic film components are connected in one-to-one correspondence. The control switches are configured to, according to at least one light shielding region and a light transmitting region of the mask, control light transmittances of the electrochromic film components in one-to-one correspondence.
Public/Granted literature
- US20200285126A1 MASK AND MANUFACTURING METHOD THEREOF, AND LIGHT SHIELDING DEVICE AND CONTROL METHOD THEREOF Public/Granted day:2020-09-10
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