- Patent Title: Method for manufacturing organic device, and film forming device
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Application No.: US16480163Application Date: 2018-01-05
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Publication No.: US10944054B2Publication Date: 2021-03-09
- Inventor: Shinichi Morishima , Eiji Kishikawa , Masaya Shimogawara
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2017-009642 20170123
- International Application: PCT/JP2018/000108 WO 20180105
- International Announcement: WO2018/135323 WO 20180726
- Main IPC: H01L51/40
- IPC: H01L51/40 ; H01L51/00 ; H01L51/56

Abstract:
A method for manufacturing an organic device 10 according to an embodiment includes: a film forming step of continuously forming first to N-th layers (N is an integer of 2 or more) on a first electrode layer 14 formed on a main surface 12a of a flexible substrate while continuously conveying the flexible substrate 12, wherein in the film forming step, the first to N-th layers are sequentially formed on the first electrode layer by supplying materials of the first to N-th layers from first to N-th film forming sources to the flexible substrate through first to N-th shielding parts arranged between the first to N-th film forming sources and the flexible substrate, the first to N-th shielding parts are fixed in a conveyance direction of the flexible substrate in a state of being spaced apart from the flexible substrate, and a shielding area due to at least one shielding part of the first to N-th shielding parts is different from a shielding area due to other shielding part.
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