Invention Grant
- Patent Title: Nozzle for cleaning substrate
-
Application No.: US16198390Application Date: 2018-11-21
-
Publication No.: US10943799B2Publication Date: 2021-03-09
- Inventor: Man Ho Han , Young Min Ju , Guk Ki Ahn , Yun Deok Kim
- Applicant: HS HI-TECH CO., LTD.
- Applicant Address: KR Hwaseong
- Assignee: HS HI-TECH CO., LTD.
- Current Assignee: HS HI-TECH CO., LTD.
- Current Assignee Address: KR Hwaseong
- Priority: KR10-2017-0163667 20171130
- Main IPC: B08B3/02
- IPC: B08B3/02 ; H01L21/67 ; B29C65/08 ; B29C65/00 ; B05B1/18 ; B29L31/00

Abstract:
The present invention relates to a nozzle for cleaning a substrate capable of spraying deionized water for cleaning a substrate to the substrate, the nozzle including a first body made of a resin material and provided with a first part of a deionized water passage and a deionized water supply hole to supply the deionized water, a second body made of a resin material and provided with a second part of the deionized water passage and a plurality of spray holes to spray the deionized water to the substrate, a fusible protrusion provided in the first body or the second body along the deionized water passage and configured such that a part thereof is fused during ultrasonic welding, so as to couple the first body and the second body together, and a fusible protrusion accommodating part formed in the first body or the second body to accommodate the fusible protrusion.
Public/Granted literature
- US20190164788A1 NOZZLE FOR CLEANING SUBSTRATE Public/Granted day:2019-05-30
Information query
IPC分类: