Invention Grant
- Patent Title: Methods for ALD of metal oxides on metal surfaces
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Application No.: US16195168Application Date: 2018-11-19
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Publication No.: US10943780B2Publication Date: 2021-03-09
- Inventor: Bhaskar Jyoti Bhuyan , Mark Saly , David Thompson , Li-Qun Xia
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/455 ; C23C16/02 ; C23C16/40
Abstract:
Methods for depositing metal oxide layers on metal surfaces are described. The methods include exposing a substrate to separate doses of a metal precursor, which does not contain metal-oxygen bonds, and an alcohol. These methods do not oxidize the underlying metal layer.
Public/Granted literature
- US20190157067A1 Methods For ALD Of Metal Oxides On Metal Surfaces Public/Granted day:2019-05-23
Information query
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