Invention Grant
- Patent Title: Magnetic material stack and magnetic inductor structure fabricated with surface roughness control
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Application No.: US16291795Application Date: 2019-03-04
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Publication No.: US10943732B2Publication Date: 2021-03-09
- Inventor: Hariklia Deligianni , Bruce B. Doris , Eugene J. O'Sullivan , Naigang Wang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Ryan, Mason & Lewis, LLP
- Agent Daniel Morris
- Main IPC: H01F27/24
- IPC: H01F27/24 ; H01F41/14 ; H01F41/34 ; H01F17/04 ; H01F17/00
Abstract:
A magnetic material stack comprises a first dielectric layer, a first magnetic material layer on the first dielectric layer, at least a second dielectric layer on the first magnetic material layer and at least a second magnetic material layer on the second dielectric layer. One or more surfaces of the layers are smoothed to remove at least a portion of surface roughness on the respective layers.
Public/Granted literature
- US20190198243A1 MAGNETIC MATERIAL STACK AND MAGNETIC INDUCTOR STRUCTURE FABRICATED WITH SURFACE ROUGHNESS CONTROL Public/Granted day:2019-06-27
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