Invention Grant
- Patent Title: Techniques for initializing resistive memory devices by applying different polarity voltages across resistance change material
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Application No.: US16334737Application Date: 2017-08-22
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Publication No.: US10943655B2Publication Date: 2021-03-09
- Inventor: Zhichao Lu , Brent Haukness , Gary Bronner
- Applicant: Hefei Reliance Memory Limited
- Applicant Address: CN Hefei
- Assignee: Hefei Reliance Memory Limited
- Current Assignee: Hefei Reliance Memory Limited
- Current Assignee Address: CN Hefei
- Agency: Sheppard Mullin Richter & Hampton LLP
- International Application: PCT/US2017/047902 WO 20170822
- International Announcement: WO2018/057191 WO 20180329
- Main IPC: G11C13/00
- IPC: G11C13/00 ; G11C29/12

Abstract:
The embodiments herein describe technologies of initializing resistive memory devices (e.g., non-volatile and volatile memory devices). In one method, a first voltage is applied across a resistance change material of a memory cell to form an initial filament and multiple cycles are performed to condition the initial filament. Each of the multiple cycles includes: applying a second voltage with a first polarity across the resistance change material; and applying a third voltage with a second polarity across the resistance change material.
Public/Granted literature
- US20190392897A1 TECHNIQUES FOR INITIALIZING RESISTIVE MEMORY DEVICES Public/Granted day:2019-12-26
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