Invention Grant
- Patent Title: Microelectronic sensor for air quality monitoring
-
Application No.: US16122265Application Date: 2018-09-05
-
Publication No.: US10932684B2Publication Date: 2021-03-02
- Inventor: Ayal Ram
- Applicant: EPITRONIC HOLDINGS PTE LTD.
- Applicant Address: SG Singapore
- Assignee: EPITRONIC HOLDINGS PTE LTD.
- Current Assignee: EPITRONIC HOLDINGS PTE LTD.
- Current Assignee Address: SG Singapore
- Agency: The Roy Gross Law Firm, LLC
- Agent Roy Gross
- Main IPC: H01L29/778
- IPC: H01L29/778 ; A61B5/0408 ; H01L29/205 ; A61B5/00 ; A61B5/04 ; A61B5/11 ; A61B5/0452 ; A61B3/16 ; A61B1/273 ; A61B5/0478 ; A61B7/04 ; A61B5/021 ; G01N27/12 ; G01N33/00 ; A61B5/08 ; H01L29/20

Abstract:
In some embodiments, a microelectronic sensor includes an open-gate pseudo-conductive high-electron mobility transistor and used for air quality monitoring. The transistor comprises a substrate, on which a multilayer hetero-junction structure is deposited. This hetero-junction structure comprises a buffer layer and a barrier layer, both grown from III-V single-crystalline or polycrystalline semiconductor materials. A two-dimensional electron gas (2DEG) conducting channel is formed at the interface between the buffer and barrier layers and provides electron current in the system between source and drain electrodes. The source and drain contacts are non-ohmic (capacitively-coupled) and connected to the formed 2DEG channel and to the electrical metallizations, the latter are placed on top of the transistor and connect it to the sensor system. The metal gate electrode is placed between the source and drain areas on or above the barrier layer, which may be recessed or grown to a specific thickness. An optional dielectric layer is deposited on top of the barrier layer.
Public/Granted literature
- US20190021623A1 MICROELECTRONIC SENSOR FOR AIR QUALITY MONITORING Public/Granted day:2019-01-24
Information query
IPC分类: