Invention Grant
- Patent Title: Articles including metallized vias
-
Application No.: US16245793Application Date: 2019-01-11
-
Publication No.: US10917966B2Publication Date: 2021-02-09
- Inventor: Shrisudersan Jayaraman
- Applicant: Corning Incorporated
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Amy T. Lang; Kevin L. Bray
- Main IPC: H05K1/09
- IPC: H05K1/09 ; H05K1/11 ; H01L23/15 ; H01L21/48 ; H01L23/14 ; H01L23/498 ; H05K1/03 ; H05K3/16 ; H05K3/38 ; H05K3/42

Abstract:
An article includes a wafer having a body which defines a first surface and a second surface. The wafer defines a via having a via surface extending between the first and second surfaces through the body. An adhesion layer is positioned on the via surface. At least a portion of the via surface is free of the adhesion layer. A metallic component is positioned within the via and extends from the first surface to the second surface.
Public/Granted literature
- US10887987B2 Articles including metallized vias Public/Granted day:2021-01-05
Information query