Invention Grant
- Patent Title: Deposition apparatus
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Application No.: US15395200Application Date: 2016-12-30
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Publication No.: US10917960B2Publication Date: 2021-02-09
- Inventor: Masahiro Atsumi , Hidekazu Nishimura , Masahiro Shibamoto , Hiroshi Yakushiji
- Applicant: CANON ANELVA CORPORATION
- Applicant Address: JP Kawasaki
- Assignee: CANON ANELVA CORPORATION
- Current Assignee: CANON ANELVA CORPORATION
- Current Assignee Address: JP Kawasaki
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: JP2016-001947 20160107
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/10 ; C23C14/06 ; C23C14/32 ; C23C14/56 ; C23C16/458 ; C23C16/50 ; H05H1/48

Abstract:
A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.
Public/Granted literature
- US20170202077A1 DEPOSITION APPARATUS Public/Granted day:2017-07-13
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