Invention Grant
- Patent Title: Optical device wafer processing method
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Application No.: US16546955Application Date: 2019-08-21
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Publication No.: US10916679B2Publication Date: 2021-02-09
- Inventor: Tasuku Koyanagi
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2018-159593 20180828
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
An optical device wafer processing method for transferring an optical device layer of an optical device wafer onto a transfer member includes: a dividing groove forming step of forming dividing grooves in a buffer layer; a transfer member joining step of joining the transfer member to a front surface of the optical device layer; and a laser beam applying step of applying a pulsed laser beam from a back surface side of a crystalline substrate. In the laser beam applying step, the buffer layer, or the buffer layer and part of the optical device layer, left without being divided in the dividing groove forming step, are modified in nature.
Public/Granted literature
- US20200075796A1 OPTICAL DEVICE WAFER PROCESSING METHOD Public/Granted day:2020-03-05
Information query
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