Invention Grant
- Patent Title: Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
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Application No.: US16424768Application Date: 2019-05-29
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Publication No.: US10915686B2Publication Date: 2021-02-09
- Inventor: Alan E. Rosenbluth
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Harrington & Smith
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F30/367 ; G03F7/20 ; G03F1/36

Abstract:
Disclosed are mask definition tools, apparatus, methods, systems and computer program products configured to process data representing a semiconductor fabrication mask. A non-limiting example of a method includes performing a decomposition process on a full Transmission Cross Coefficient (TCC) using coherent optimal coherent systems (OCS) kernels; isolating a residual TCC that remains after some number of coherent kernels are extracted from the full TCC; and performing at least one decomposition process on the residual TCC using at least one loxicoherent system. The loxicoherent system uses a plurality of distinct non-coherent kernel functions and is a compound system containing a paired coherent system and an incoherent system that act in sequence. An output of the coherent system is input as a self-luminous quantity to the incoherent system, and the output of the incoherent system is an output of the loxicoherent system.
Public/Granted literature
- US20200074031A1 Tool To Provide Integrated Circuit Masks With Accurate Dimensional Compensation Of Patterns Public/Granted day:2020-03-05
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