Invention Grant
- Patent Title: Charged particle beam device and optical-axis adjusting method thereof
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Application No.: US16745424Application Date: 2020-01-17
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Publication No.: US10910194B2Publication Date: 2021-02-02
- Inventor: Shuhei Yabu
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur PC
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/21 ; H01J37/12 ; H01J37/141 ; H01J37/147 ; H01J37/28

Abstract:
A charged particle beam device includes a charged particle source which emits a charged particle beam radiated on a sample; a condenser lens system which has at least one condenser lens focusing the charged particle beam at a predetermined demagnification; a deflector which is positioned between a condenser lens of a most downstream side and a charged particle source in the condenser lens system, and moves a virtual position of the charged particle source; and a control unit which controls the deflector and the condenser lens system. The control unit controls the deflector to move the virtual position of the charged particle source to a position of suppressing a deviation, which is caused by a change of the demagnification of the condenser lens system, of a center trajectory of the charged particle beam downstream of the condenser lens system.
Public/Granted literature
- US20200152419A1 CHARGED PARTICLE BEAM DEVICE AND OPTICAL-AXIS ADJUSTING METHOD THEREOF Public/Granted day:2020-05-14
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