Invention Grant
- Patent Title: Doped gate dielectric materials
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Application No.: US15663584Application Date: 2017-07-28
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Publication No.: US10903333B2Publication Date: 2021-01-26
- Inventor: Yu Cao , Rongming Chu , Zijian Ray Li
- Applicant: HRL Laboratories, LLC
- Applicant Address: US CA Malibu
- Assignee: HRL Laboratories, LLC
- Current Assignee: HRL Laboratories, LLC
- Current Assignee Address: US CA Malibu
- Agency: Ladas & Parry
- Main IPC: H01L29/51
- IPC: H01L29/51 ; H01L29/20 ; H01L29/778 ; H01L29/78 ; H01L29/417 ; H01L29/43 ; H01L29/06 ; H01L21/28 ; H01L29/423

Abstract:
A field effect transistor having at least a gate, source, and drain electrodes and a semiconductor channel for controlling transport of charge carriers between the source and drain electrodes, the gate being insulated from the channel by an dielectric, at least a portion of the dielectric disposed between the gate electrode and the semiconductor channel being doped or imbued with the an element which if doped or imbued into a semiconductor material would cause the semiconductor to be p-type. The p-type element used to dope or imbue the gate dielectric is preferably Mg.
Public/Granted literature
- US20180097081A1 Doped Gate Dielectric Materials Public/Granted day:2018-04-05
Information query
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