Invention Grant
- Patent Title: Patterning graphene with a hard mask coating
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Application No.: US15623279Application Date: 2017-06-14
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Publication No.: US10903319B2Publication Date: 2021-01-26
- Inventor: Deng Pan , Brett Goldsmith
- Applicant: Nanomedical Diagnostics, Inc.
- Applicant Address: US CA San Diego
- Assignee: Nanomedical Diagnostics, Inc.
- Current Assignee: Nanomedical Diagnostics, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Kunzler Bean & Adamson
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L21/02 ; H01L21/027 ; H01L21/311

Abstract:
Embodiments of the disclosed technology include patterning a graphene sheet for biosensor and electronic applications using lithographic patterning techniques. More specifically, the present disclosure is directed towards the method of patterning a graphene sheet with a hard mask metal layer. The hard mask metal layer may include an inert metal, which may protect the graphene sheet from being contaminated or damaged during the patterning process.
Public/Granted literature
- US20170365562A1 PATTERNING GRAPHENE WITH A HARD MASK COATING Public/Granted day:2017-12-21
Information query
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