Invention Grant
- Patent Title: Magnetic memory device and fabrication method thereof
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Application No.: US16504345Application Date: 2019-07-08
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Publication No.: US10903269B2Publication Date: 2021-01-26
- Inventor: Chih-Wei Kuo , Yu-Tsung Lai , Jiunn-Hsiung Liao
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: CN201910484876 20190605
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/02 ; H01L21/768 ; H01L43/12

Abstract:
A magnetic memory device includes a first dielectric layer on a substrate, first and second via plugs in the first dielectric layer, first and second cylindrical memory stacks on the first and second via plugs, respectively, and an insulating cap layer conformally disposed on the first dielectric layer and on sidewalls of the first and second cylindrical memory stacks. The insulating cap layer is not disposed in a logic area and a via forming region between the first and second cylindrical memory stacks.
Information query
IPC分类: