Invention Grant
- Patent Title: Method of obtaining amount of deviation of a measuring device, and method of calibrating transfer position data in a processing system
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Application No.: US16198924Application Date: 2018-11-23
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Publication No.: US10903100B2Publication Date: 2021-01-26
- Inventor: Kippei Sugita , Daisuke Kawano
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2017-225510 20171124
- Main IPC: G01R27/26
- IPC: G01R27/26 ; H01L21/67 ; G01D5/241 ; H01L21/68 ; H01L21/683 ; H01L21/677 ; H01J37/32 ; H01L21/687

Abstract:
A measuring device includes sensor electrodes provided along a periphery of a base substrate such that a sum A of shortest distances from the sensor electrodes to an inner peripheral surface of a focus ring becomes a constant value, the sum A satisfying ∑ i = 1 N a C i = A the number of the sensor electrodes, Ci: measurement values and “a”: constant). A method of obtaining the amount of deviation of the central position of the measuring device in a region surrounded by the focus ring from the center of the region, includes: calculating the measurement values Ci using the measuring device; calculating the constant “a” using the measurement values Ci; calculating distances from the sensor electrodes to the inner peripheral surface of the focus ring using the constant “a” and the measurement values Ci; and calculating the amount of deviation of the central position of the measuring device based on the calculated distances.
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