Invention Grant
- Patent Title: Substrate processing apparatus and substrate processing method
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Application No.: US15743967Application Date: 2016-04-21
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Publication No.: US10903091B2Publication Date: 2021-01-26
- Inventor: Akio Hashizume
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: JP2015-161294 20150818
- International Application: PCT/JP2016/062655 WO 20160421
- International Announcement: WO2017/029838 WO 20170223
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02 ; H01L21/304
Abstract:
According to the present invention, after supplying a rinse liquid containing water to a substrate that is held horizontally, an IPA-containing liquid which contains isopropyl alcohol is supplied to the substrate to which the rinse liquid adhering. Subsequently, an IPA-containing liquid low in moisture concentration is supplied to the substrate. The IPA-containing liquid which has been supplied to the substrate is recovered and supplied to the substrate again.
Public/Granted literature
- US20180197756A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Public/Granted day:2018-07-12
Information query
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