Invention Grant
- Patent Title: Power gating in stacked die structures
-
Application No.: US16118899Application Date: 2018-08-31
-
Publication No.: US10826492B2Publication Date: 2020-11-03
- Inventor: Prashant Dubey , Sundeep Ram Gopal Agarwal
- Applicant: Xilinx, Inc.
- Applicant Address: US CA San Jose
- Assignee: XILINX, INC.
- Current Assignee: XILINX, INC.
- Current Assignee Address: US CA San Jose
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H03K17/687 ; H01L27/06 ; H01L23/48 ; H01L23/528

Abstract:
Examples of the present disclosure provide power gating for stacked die structures. In some examples, a stacked die structure comprises a first die and a second die bonded to the first die. In some examples, a power gated power path is from a bonding interface between the dies through TSVs in the second die, a power gating device in the second die, and routing of metallization layers in the second die to the circuit region in the second die. In some examples, a power gated power path comprises a power gating device in a power gating region of the first die and is configured to interrupt a flow of current through the power gated power path to a circuit region in the second die.
Public/Granted literature
- US20200076424A1 POWER GATING IN STACKED DIE STRUCTURES Public/Granted day:2020-03-05
Information query
IPC分类: