Invention Grant
- Patent Title: Use of etch resist masked anode frame for facilitation of laser cutting, particle and leakage current reduction
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Application No.: US16112353Application Date: 2018-08-24
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Publication No.: US10825613B2Publication Date: 2020-11-03
- Inventor: Thomas F. Strange , Ralph Jason Hemphill , David R. Bowen , Kurt J. Erickson
- Applicant: PACESETTER, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Pacesetter, Inc.
- Current Assignee: Pacesetter, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01G9/042
- IPC: H01G9/042 ; H01G9/145 ; H01G9/055 ; H01G9/00 ; A61N1/39 ; C23F1/14 ; H01G9/045 ; C25F3/04 ; C25F3/14 ; A61N1/375

Abstract:
The present invention is directed to a method of etching anode foil in a non-uniform manner which minimizes thermal oxidation during foil cutting. Having less oxide improves the ability to cut through aluminum anodes with lower energy rates. In aluminum foils, it has been found that a masking step before etching reduces conversion of boehmite aluminum oxide to alpha-phase corundum during laser cutting of anodes, which increases edge quality and productivity. Additionally, the non-etched anode frame allows for less surface area to form during the aging process. As a result, the leakage current is reduced by the proportion of edge to anode surface area, and the aging process will be faster, leading to higher productivity.
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