Invention Grant
- Patent Title: Method for manufacturing air pulse generating element
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Application No.: US16380988Application Date: 2019-04-10
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Publication No.: US10771891B2Publication Date: 2020-09-08
- Inventor: David Hong , Chiung C. Lo , Chun-I Chang
- Applicant: xMEMS Labs, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: xMEMS Labs, Inc.
- Current Assignee: xMEMS Labs, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Winston Hsu
- Main IPC: H04R1/32
- IPC: H04R1/32 ; H04R17/00 ; H04R19/00 ; H04R19/02 ; H04R9/06 ; G10K9/12

Abstract:
A method for manufacturing an air pulse generating element is provided. First, a thin film layer including a membrane is provided, and then, a plurality of actuators are formed on the thin film layer. After that, a first chamber is formed between the thin film layer and a first plate and followed by patterning the thin film layer to form a plurality of valves, in which the membrane and the valves are formed of the thin film layer. Subsequently, a second chamber is formed between the thin film layer and a second plate, and a plurality of channels are formed in the first plate and the second plate.
Public/Granted literature
- US20200059721A1 METHOD FOR MANUFACTURING AIR PULSE GENERATING ELEMENT Public/Granted day:2020-02-20
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