Invention Grant
- Patent Title: Metal resistor structures with nitrogen content
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Application No.: US15690923Application Date: 2017-08-30
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Publication No.: US10770537B2Publication Date: 2020-09-08
- Inventor: Chih-Chao Yang
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent L. Jeffrey Kelly
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01L21/321

Abstract:
Resistor elements and methods of forming the resistor elements generally include increasing resistivity by diffusing nitrogen ions from an underlying dielectric layer into a metal resistor layer defining the resistor elements. One or more embodiments include a first resistor element and at least one additional resistor element disposed on a first dielectric material and at least one additional dielectric material, respectively, of a dielectric layer. The first dielectric material is different from the at least one additional dielectric material, and the first resistor element has a different resistivity than the at least one additional resistor element.
Public/Granted literature
- US20180083090A1 METAL RESISTOR STRUCTURES WITH NITROGEN CONTENT Public/Granted day:2018-03-22
Information query
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