Invention Grant
- Patent Title: Semiconductor wafer device and manufacturing method thereof
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Application No.: US16105893Application Date: 2018-08-20
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Publication No.: US10770331B2Publication Date: 2020-09-08
- Inventor: Bor-Ping Jang , Chien Ling Hwang , Hsin-Hung Liao , Yeong-Jyh Lin
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L23/544 ; H01L21/78 ; B23K26/364 ; B23K26/40 ; B23K26/402 ; B23K103/00

Abstract:
A semiconductor device includes a carrier having a first central axis extending along a first direction and a second central axis extending along a second direction, a plurality of dies disposed on a surface of the carrier, and a plurality of scribing lines separating the plurality of dies from each other. The plurality of scribing lines include a plurality of continuous lines along the first direction and a plurality of discontinuous lines along the second direction, at least one of the plurality of continuous lines overlaps the first central axis, at least one of the plurality of discontinuous lines overlaps the second central axis. The plurality of dies are symmetrically arranged on the carrier about the first central axis and the second central axis.
Public/Granted literature
- US20180358255A1 SEMICONDUCTOR WAFER DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-12-13
Information query
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