Invention Grant
- Patent Title: Magnetic tunnel junction with low defect rate after high temperature anneal for magnetic device applications
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Application No.: US15835592Application Date: 2017-12-08
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Publication No.: US10763428B2Publication Date: 2020-09-01
- Inventor: Huanlong Liu , Yuan-Jen Lee , Jian Zhu , Guenole Jan , Po-Kang Wang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L43/10
- IPC: H01L43/10 ; H01F10/32 ; H01F41/30 ; G11C11/16 ; H01L43/02 ; H01L43/08 ; H01L43/12

Abstract:
A magnetic tunnel junction is disclosed wherein the reference layer and free layer each comprise one layer having a boron content from 25 to 50 atomic %, and an adjoining second layer with a boron content from 1 to 20 atomic %. One of the first and second layers in each of the free layer and reference layer contacts the tunnel barrier. Each boron containing layer has a thickness of 1 to 10 Angstroms and may include one or more B layers and one or more Co, Fe, CoFe, or CoFeB layers. As a result, migration of non-magnetic metals along crystalline boundaries to the tunnel barrier is prevented, and the MTJ has a low defect count of around 10 ppm while maintaining an acceptable TMR ratio following annealing to temperatures of about 400° C. The boron containing layers are selected from CoB, FeB, CoFeB and alloys thereof including CoFeNiB.
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