Invention Grant
- Patent Title: Semiconductor device and power conversion apparatus
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Application No.: US16465429Application Date: 2017-12-25
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Publication No.: US10763346B2Publication Date: 2020-09-01
- Inventor: Tomoyasu Furukawa , Masaki Shiraishi , Toshiaki Morita
- Applicant: Hitachi Power Semiconductor Device, Ltd.
- Applicant Address: JP Hitachi-shi
- Assignee: Hitachi Power Semiconductor Device, Ltd.
- Current Assignee: Hitachi Power Semiconductor Device, Ltd.
- Current Assignee Address: JP Hitachi-shi
- Agency: Crowell & Moring LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@74f17856
- International Application: PCT/JP2017/046299 WO 20171225
- International Announcement: WO2018/135239 WO 20180726
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L23/522 ; H01L29/417 ; H01L29/45 ; H01L29/861

Abstract:
Provided is a semiconductor device in which, in a case where a metallic plate (a conductive member) is bonded by being sintered to a semiconductor chip having an IGBT gate structure, an excess stress is less likely to be generated in a gate wiring section of the semiconductor chip even when pressure is applied in a sinter bonding process, so that a characteristic failure is reduced. The semiconductor device according to the present invention is characterized by: being provided with a semiconductor chip having a gate structure represented by an IGBT; including first gate wiring and second gate wiring formed on the surface of the semiconductor chip; and including an emitter electrode disposed so as to cover the first gate wiring and a sintered layer disposed above the emitter electrode, wherein a multilayer structure formed by including at least the emitter electrode and the sintered layer on the surface of the semiconductor chip continuously exists over a range including an emitter electrode connecting contact and gate wiring regions.
Public/Granted literature
- US20200006301A1 Semiconductor Device and Power Conversion Apparatus Public/Granted day:2020-01-02
Information query
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